| Customization: | Available |
|---|---|
| Spatial Mode: | Tem00(M² <1.3) |
| Beam Divergence Full Angle: | <2mrad |
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| MODEL | Grace X 355-15S | Grace X 355-20S |
| Wavelength | 355nm | |
| Pulse Repetition Rate Range | 50kHz to 150kHz | 70kHz to 150kHz |
| Pulse Width | 22±2ns@50kHz | 26±2ns@100kHz |
| Average Power | >15W@50kHz | >20W@70kHz |
| Average Power Stability | <3%RMS over 8 hours | |
| Pulse-to-Pulse Stability | <3%RMS | |
| Spatial Mode | TEM00(M² <1.3) | |
| Beam Divergence Full Angle | <2mrad | |
| 1/e² Beam Diameter | 0.6±0.2mm | |
| Beam Roundness | >90% | |
| Beam Pointing Stability | <50urad | |
| Polarization Direction | Horizontal | |
| Polarization Ratio | 100:1 | |
| Size | 580*210*117mm | |
| Weight | 19.5kg | |
| Cooling | Water-cooling | |
Ultraviolet (UV) lasers, particularly the 355nm wavelength, are sophisticated optical devices that have garnered significant attention due to their wide-ranging applications in biomedicine, material processing, and optical communication.
The 355nm UV laser is typically generated through a process of frequency conversion. An infrared pump laser (commonly at 1064nm) is passed through nonlinear crystals, such as KDP (potassium dihydrogen phosphate) or BBO (β-barium borate). These crystals perform third-harmonic generation, effectively tripling the frequency and shortening the wavelength to the ultraviolet 355nm.
This process results in a laser with exceptional properties:
High Beam Quality: Allows for tight focusing to a very small spot size.
Narrow Spectral Linewidth: Provides a pure, precise wavelength.
High Energy & High Repetition Rate: Enables both powerful and rapid-pulse processing.
Laser fine micromachining involves processing materials and devices with micrometer-level accuracy. The 355nm UV nanosecond laser is a dominant tool in this field due to several key advantages:
High Photon Energy: The short UV wavelength carries more energy per photon, facilitating "cold processing" that directly breaks chemical bonds without significant heat transfer to the surrounding material.
High Material Absorption: Many materials, including polymers, glass, and semiconductors, strongly absorb UV light, leading to efficient and clean ablation.
Excellent Focusing Performance: The high beam quality allows for the creation of extremely fine features.
1. Biomedicine
The short wavelength of 355nm lasers allows for precise interaction with biological tissues and molecules. Key applications include:
Confocal Microscopy & Imaging: Used for high-resolution cellular and tissue imaging.
Laser Surgery: Enables precise ablation with minimal thermal damage to surrounding areas.
Dermatology: Effectively treats conditions like vitiligo and vascular lesions by targeting specific skin structures.
2. Material Processing and Semiconductor Manufacturing
The ability to achieve high precision makes 355nm lasers indispensable in advanced manufacturing:
Wafer Dicing and Drilling: Used for scribing and cutting brittle semiconductor wafers (like silicon) with clean, precise edges.
Lithography: Plays a role in direct-write and mask-making processes for creating microelectronic circuits.
Nanofabrication: Essential for manufacturing microelectromechanical systems (MEMS) and other miniature devices.
3. Optical Communication
The ongoing development of fiber optic technology leverages the properties of UV lasers:
Fiber Bragg Grating (FBG) Inscription: 355nm lasers are used to create periodic refractive index changes within optical fibers, which are critical components for sensors, filters, and wavelength division multiplexers.
High-Speed Sources: Their short wavelength and high energy make them suitable for developing advanced, high-capacity communication systems.
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