Sic Wafer GaN Substrates Chemical Mechanical Polishing Equipment

Product Details
Customization: Available
After-sales Service: 7*24 Hours
Function: Abrasion Resistance, Lubrication, High Temperature Resistance, Anti-Corrosion, Anti-Cold
Gold Member Since 2023

Suppliers with verified business licenses

Audited Supplier Audited Supplier

Audited by an independent third-party inspection agency

QA/QC Inspectors
The supplier has 1 QA and QC inspection staff
R&D Capabilities
The supplier has 1 R&D engineers, you can check the Audit Report for more information
Importers and Exporters
The supplier has import and export rights
Quality Assurance
The supplier provides quality assurance
to see all verified strength labels (14)
  • Sic Wafer GaN Substrates Chemical Mechanical Polishing Equipment
  • Sic Wafer GaN Substrates Chemical Mechanical Polishing Equipment
  • Sic Wafer GaN Substrates Chemical Mechanical Polishing Equipment
  • Sic Wafer GaN Substrates Chemical Mechanical Polishing Equipment
  • Sic Wafer GaN Substrates Chemical Mechanical Polishing Equipment
  • Sic Wafer GaN Substrates Chemical Mechanical Polishing Equipment
Find Similar Products
  • Overview
  • Product Description
  • Product Parameters
  • Key Features
  • Application
  • Exhibition & Customers
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
WCD-1211
Demoulding
Automatic
Condition
New
Certification
RoHS, CE
Warranty
12 Months
Automatic Grade
Semiautomatic
Installation
Desktop
Driven Type
Pneumatic
Mould Life
>1,000,000 Shots
Mechanical Configuration
3-Platen + 4-Head System
Cleaning Technology
Dual-Brush Cleaning (PVA + Nylon)
Wafer Handling
Dry-in/Dry-out Process
Uniformity Control
Wiw/Wtw <5%
Removal Rate (Rr) & Uniformity
Oxide: Nu <3%
Advanced Material Support
Sic/GaN Compatible
Horizon-T 200CMP (Oxide)
Throughput: 45 Wph
Industry Application
5g / RF Ics/Power Devices (Sic/IGBT)
Transport Package
Customized or Wooden Box Packaging
Specification
Standard Specifications
Trademark
Himalaya
Origin
China
Production Capacity
5000

Product Description

 
Product Description
Sic Wafer GaN Substrates Chemical Mechanical Polishing Equipment

 Meet all complex planarization process requirements in IC manufacturing. Suitable for mainstream 14nm/28nm logic processes, covering STI/ILD/IMD, FinFET/Metal gate/W/Cu and other processes.

Product Features

  • Layout dimensions (length * width * height) 5.70m * 2.80m * 2.70m
  • 2×2Polishing table and dual cleaning station
  • Dual independent processes and transmission systems
  • The grinding head and grinding table correspond in opposition, ensuring better process consistency( WIW & WTW <3%)
  • The output rate has significantly increased compared to international imported equipment WPH >60
Product Parameters
Sic Wafer GaN Substrates Chemical Mechanical Polishing Equipment
Sic Wafer GaN Substrates Chemical Mechanical Polishing Equipment
Sic Wafer GaN Substrates Chemical Mechanical Polishing Equipment


Advanced CMP (Chemical Mechanical Planarization) System

This table details the specifications and features of an advanced CMP system designed for complex IC manufacturing at mainstream 14nm/28nm technology nodes.

 
 
Category Specification / Feature
Process Node & Application Suitable for mainstream 14nm/28nm logic processes.
Covers STI, ILD, IMD, FinFET, Metal Gate, Tungsten (W), and Copper (Cu) processes.
Core Product Features  High-Throughput Design: 2×2 polishing tables with dual cleaning stations.
 Independent Processing: Dual, independent process and transmission systems for parallel operation.
 Superior Uniformity: Opposing grind head and table configuration ensures excellent within-wafer (WIW) and wafer-to-wafer (WTW) uniformity (<3%).
 High Productivity: Output (Wafers Per Hour, WPH >60) is significantly higher than comparable international imported equipment.
Physical Dimensions Layout: 5.70m (Length) × 2.80m (Width) × 2.70m (Height)
 
Key Features

Sic Wafer GaN Substrates Chemical Mechanical Polishing Equipment
Pressurization Method
Utilizes external airbag pressurizationfor nano-level material removal

Constant Temperature System
Features an infrared temperaturemeasurement system to ensurethe polishing plate maintains aconstant temperature

Cleaning Unit
Equipped with double-sided PVA brushes for automaticdouble-sided scrubbing anddrying

Fully Automatic System
Provides fully automatic loadingand unloading with a dry-in, dry-out" workflow

 
Application

Sic Wafer GaN Substrates Chemical Mechanical Polishing Equipment

Exhibition & Customers

Sic Wafer GaN Substrates Chemical Mechanical Polishing EquipmentSic Wafer GaN Substrates Chemical Mechanical Polishing EquipmentJiangsu Himalaya Semiconductor Co., Ltd. Was established in 2019, mainly engaged in international trade and integration of semiconductor industry equipment. The equipment is currently imported and exported to over 30 countries, with over 200 customers and suppliers, aiming to control the procurement of the highest cost-effective products in the final stage for customers, and strive for one-time payment collection and risk avoidance for suppliers!
Our main products:Die Bonder,Wire Bonding,Laser Marking(ID IC Wafer),Laser Grooving,Laser Cutting(Glass Ceramics Wafers Packaging,Laser Internal Modification Machine Si /Sic Wafe,Laser Internal Modification Machine Lt/Ln Wafer,Laser Annealing Machine for Si/Sic,Automatic Dicing Saw Machine(Wafer Packaging)),Automatic Silicone Dispensing Equipment.

Packaging & Shipping

 

Sic Wafer GaN Substrates Chemical Mechanical Polishing Equipment
FAQ

Q1:How to choose a suitable machine?
A1:You can tell us the working piece material, size, and the request of machine function. We can recommend the most suitable machine according to our experience. 

Q2:What is the warranty period for the equipment?
A2:One year warranty and 24 hours online professional technical support.


Q3:Why choose us?
A3:OEM/ODM/Designing. 

Send your message to this supplier

*From:
*To:
*Message:

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now
Send Inquiry
Chat Now