Customization: | Available |
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Certification: | ISO9001, CCC, JIS |
Protection: | Corrosion Resistance |
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Electron Emitter/Acceleration voltage | TFE (ZrO/W)/5 to 50kV |
Min. beam diameter | 2.0nm (for Academic and R&D) 4.0nm (for Production) |
Advanced lithography functions (Optional) | Field size modulation lithography, axial symmetry pattern lithography |
Field size | sq. 30μm - sq. 1000μm (50kV) (for Academic and R&D) sq. 30μm - sq. 1500μm (50kV) (for Production) |
Work piece size | 4,6,8inchΦ |
CAD software | Dedicated CAD (Standard), GDS II conversion (Optional), DXF conversion (Optional) |
OS | Windows |
UI | English |