| Customization: | Available |
|---|---|
| After-sales Service: | 7*24 Hours |
| Function: | High Temperature Resistance |
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This machine is equipped with a wafer splitting device for brittle materials such as 2 "~8" LED/SIC/glass/ceramic. The laser processed wafer is supported by the receiving platform as a reference, supplemented by the splitting action of the blade lifting to separate the chips. During the splitting process, the CCD automatically corrects and takes photos to detect the splitting effect, ensuring that the equipment can quickly and accurately split; And achieve unmanned production, manual only needs to perform intermittent loading and unloading of material frames.

1. Loading/Unloading Mechanism
2. Precision Alignment & Splitting
3. Production Metrics
| Wafer Size | Chip Specs (µm) | Cycle Time | Hourly Output | Monthly Capacity* |
|---|---|---|---|---|
| 4-inch | 533×254 | 250s | 14.4 chips | 9,187 |
| 4-inch | 102×125 | 695s | 5.2 chips | 3,203 |
| *22 hrs/day, 28 days/month |
4. Motion Control & Mechanics
5. Quality Assurance
Key Innovation: Non-adhesive protective film (25µm) reduces blade contact damage.
| Component | Specification |
|---|---|
| Machine Dimensions | 1650×1200×1700mm (W×D×H) |
| Power Supply | 220V, 50Hz, 10A |
| Operating Environment | 20-25°C, 20-60% humidity |
| Compressed Air | 0.6MPa, Φ8mm interface |
Partial sample effect
5.3 Machine Placement Requirements (W) 1650 × (D) 1200 × (H) 1700 (mm) (excluding signal lights)Additionally, at least 600mm should be reserved around the perimeter
Environmental requirements for use

Mission: Bridge high-efficiency semiconductor equipment with global demand through integrated trade solutions.
| Product | Key Applications | Technical Highlights |
|---|---|---|
| Laser Marking (ID/IC Wafer) | Wafer traceability, alphanumeric/2D codes | 10µm resolution, 300mm/s marking speed |
| Laser Grooving | PCB depaneling, SiC wafer scribing | 20-100µm groove width, ±2µm repeatability |
| Laser Cutting | Glass/ceramic wafers (≤1mm thickness) | Crack-free edges, 150W pulsed laser |
| Laser Internal Modification | Si/SiC wafer stealth dicing, LT/LN wafer processing | 1064nm/355nm wavelength options |
| Laser Annealing (Si/SiC) | Dopant activation, defect repair | Uniformity ≤3% across 300mm wafers |
Q1:How to choose a suitable machine?
A1:You can tell us the working piece material, size, and the request of machine function. We can recommend the most suitable machine according to our experience.
Q2:What is the warranty period for the equipment?
A2:One year warranty and 24 hours online professional technical support.
Q3:How to choose a suitable machine?
A3:You can tell us the request of machine function. We can recommend the most suitable machine according to our experience.